Daikin Industries, Ltd. HFC-23 (CHF3)
Daikin Industries, Ltd. HFC-23 (CHF3) is a high-purity gas designed for semiconductor manufacturing, boasting a purity level of 99.999 vol% (5N) or higher. It is specifically tailored for etching SiO₂ and low-k films, catering to the electrical and electronics sectors, particularly parts and component fabrication.
Properties
- Physical Form
- Gas
Product families
Applications
- Semiconductor Manufacturing
Product Families
- Electronic Chemicals
Other characteristics
- Features
- High Purity
- Functions
- Etchant
- Applicable Processes
- Semiconductor Manufacturing
- Markets
- Electrical & Electronics
- Technology
- Industrial Additives & Materials
- ChemicalFormula
- CHF₃
- Inspection Items
Purity (excluding air content), other fluorocarbons, acid content, moisture, air content
- HIGHLIGHTS
Purity is 99.999vol% (5N) or more for semiconductor manufacturing.; Mainly suitable for etching SiO2 and low-k films.
- Packing Specification
- 10L container, 47L container, etc.
- Industrial Additives Features
- High Purity
- Industrial Additives Functions
- Etchant
- Safety Information
Be sure to read the Safety Data Sheet (SDS) and precautions on the label before using.. This product has been developed for industrial purposes and we shall not guarantee the the safety if used for any other purposes. If it is going to be used for medical or food applications, please contact us in advice.
Technical data
Table 1 of 1
3 rows| Characteristic | Value | Unit |
|---|---|---|
| Boiling Point | 82 | °C |
| Molecular Weight | 70.01 | — |
| Vapor Pressure (at 25°C) | 4.729 | MPa |
