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Gelest SIH5841.0

CAS Number
78560-44-8
Chemical Name
2-(Perfluorooctyl)Ethyl Trichlorosilane
Chemical Family
Silanes
Molecular Formula
C₁₀H₄Cl₃F₁₇Si

Gelest (HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRICHLOROSILANE (SIH5841.0) functions as an adhesion promoter and coupling agent. It is commonly used in chemical manufacturing.

Properties

Physical Form
Liquid

Identification

CASE Ingredients Functions
Adhesion PromoterCoupling Agent

Product families

Applications

Industrial — Chemical & Industrial Manufacturing
  • Chemical Manufacturing

Product Families

CASE Ingredients — Additives
  • Functional Additives
Base Chemicals & Intermediates — Intermediates
  • Other Intermediates

Other characteristics

Functions
Adhesion Promoter, Coupling Agent
Markets
Industrial
Technology
  • Base Chemicals & Intermediates
  • CASE Ingredients
Extraction Process

Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. In most cases, ALD reactions use two chemical precursors which react with a surface one at a time in a sequential, self-limiting, manner.; A thin film results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is their conformality and the tact that the amount of control provided by an ALD arrangement (where the reacting precursors are spatially separated) allows to obtain very thin deposited layers (as fine as 0.1 A per cycle).; Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films, but are stable enough to be handled and safely delivered to the reaction chamber.

Standard Packaging
  • 5 g
  • 25 g
  • 500 g
  • 2 kg
  • Packaged over copper powder
Chemical Inventories
TSCA (USA)
Base Chemicals Functions
Coupling Agent
SAMs (Self-Assembled Monolayers)

They can be applied neat or in solution via conventional lithography techniques to form SAMs. SAM is a layer of amphiphilic molecules created by the chemisorption onto a metal oxide, precious metal surface, plastic or nanoparticle substrates, followed by the 2-dimensional alignment of hydrophobic groups to form a structures single monolayer. The surface can be selectively modified to achieve the desired antisticktion, mechanical and chemical properties for microelectromechanical systems (MEMS) and nanoelectromechanical systems (NEMS).

Conventional Surface Bonding

Aliphatic, fluorinated aliphatic or substituted aromatic hydrocarbon substituents are the hydrophobic entities which enable silanes to induce surface hydrophobicity. The organic substitution of the silane must be non-polar. The hydrophobic effect of the organic substitution can be related to the free energy of transfer of hydrocarbon molecules from an aqueous phase to a homogeneous hydrocarbon phase. A successful hydrophobic coating must eliminate or mitigate hydrogen bonding and shield polar surfaces from interaction with water by creating a non-polar interphase.. Although silane and silicone derived coatings are in general the most hydrophobic, they maintain a high degree of permeability to water vapor. This allows coatings to breathe and reduce deterioration at the coating interface associated with entrapped water. Since ions are not transported through non-polar silane and silicone coatings, they offer protection to composite structures ranging from pigmented coatings to rebar reinforced concrete.

Technical data

Table 1 of 2

2 rows
CharacteristicValueUnit
Boiling Point216 - 218°C
Melting Point10 - 11°C

Table 2 of 2

6 rows
CharacteristicValueUnit
Hydrolytic Sensitivity8 (Reacts rapidly with moisture, water, protic solvents)—
Surface Tension (of treated surfaces)12.0mN/m
Molecular Weight581.56g/mol
Purity97.0%
Density1.703g/ml
Refractive Index (at 20°C)1.349—

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