Gelest AKT872
- CAS Number
- 546-68-9
- Chemical Name
- Titanium tetraisopropanolate
- Chemical Family
- AlkoxidesTitanium Compounds
- Molecular Formula
- C₁₂H₂₈O₄Ti
Gelest TITANIUM ISOPROPOXIDE (AKT872) functions as a catalyst and intermediate. This product is commonly used in chemical production.
Product families
Applications
- Chemical Manufacturing
Product Families
- Coordination Complexes
- Organic Salts
Other characteristics
- Synonyms
Isopropyl orthotitanate, Isopropyl titanate(IV) ((C3H7O)4Ti), Tetraisopropanolatotitanium, Tetraisopropoxytitanium, Tetraisopropoxytitanium(IV), Tetraisopropyl orthotitanate, Tetraisopropyl titanate, Tetrakis(isopropanolato)titanium, Tetrakis(isopropoxide)titanium, Tetrakis(isopropoxy)titanium, Tetrakis(isopropylato)titanium(IV), Tetrakis(isopropyloxy)titanium, TIPT, Titanium isopropoxide, Titanium isopropylate, Titanium tetraisopropoxide, Titanium tetraisopropylate, Titanium tetrakis(iso-propoxide), Titanium tetrakis(isopropoxide), Titanium(4+) isopropoxide, Titanium(IV) isopropoxide
- Markets
- Industrial
- Soluble In
- Isopropanol, Heptane
- Technology
- Base Chemicals & Intermediates
- Extraction Process
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. In most cases, ALD reactions use two chemical precursors which react with a surface one at a time in a sequential, self-limiting, manner.; A thin film results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is their conformality and the tact that the amount of control provided by an ALD arrangement (where the reacting precursors are spatially separated) allows to obtain very thin deposited layers (as fine as 0.1 A per cycle).; Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films, but are stable enough to be handled and safely delivered to the reaction chamber.
- Standard Packaging
- 100 g
- 2 kg
- 17 kg
- 190 kg
- Applicable Processes
- Chemicals Production
- Chemical Inventories
- AICS (Australia)
- DSL (Canada)
- EINECS (EU)
- ENCS (Japan)
- IECSC (China)
- INSQ (Mexico)
- ISHL (Japan)
- KECI (Korea)
- Base Chemicals Functions
- Catalyst
- Intermediate
Technical data
Table 1 of 2
5 rows| Characteristic | Value | Unit |
|---|---|---|
| Delta H Vaporization | 14.7 | kcal/mole |
| Boiling Point (at 1 mmHg) | 58.0 | °C |
| Melting Point | 15 - 19 | °C |
| Enthalpy of Formation | -377.0 | kcal/mole |
| Enthalpy of Evaporation | 14.7 | kcal/mole |
Table 2 of 2
10 rows| Characteristic | Value | Unit |
|---|---|---|
| Hydrolytic Sensitivity | 7 (Reacts slowly with moisture/water) | — |
| Density (at 20°C) | 0.937 | g/ml |
| Flash Point | 25.0 | °C |
| Refractive Index (at 20°C) | 1.4654 | — |
| Viscosity | 2.0 | cSt |
| Vapor Pressure (at 50°C) | 0.9 | mmHg |
| Vapor Pressure (at 100°C) | 19.0 | mmHg |
| Molecular Complexity | 1.4 | — |
| Metal Content (Ti) | 16.6 - 16.9 | % |
| Molecular Weight | 284.25 | g/mol |
