Gelest SIO6700.0
- CAS Number
- 556-67-2
- Chemical Name
- Octamethylcyclotetrasiloxane D4
- Chemical Family
- Siloxanes
- Molecular Formula
- C₈H₂₄O₄Si₄
Gelest OCTAMETHYLCYCLOTETRASILOXANE, 98% (SIO6700.0) functions as an intermediate. It is the basic building block for silicones by ring-opening polymerization. This product is commonly used in chemical production and polymer manufacturing.
Product families
Applications
- Chemical Manufacturing
Product Families
- Other Intermediates
Other characteristics
- Synonyms
2,2,4,4,6,6,8,8-Octamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane, 2,2,4,4,6,6,8,8-Octamethylcyclotetrasiloxane, Cyclic dimethylsiloxane tetramer, Octamethylcyclotetrasiloxane, Tetracyclomethicone
- Functions
- Intermediate
- Markets
- Industrial
- Technology
- Base Chemicals & Intermediates
- Extraction Process
Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. In most cases, ALD reactions use two chemical precursors which react with a surface one at a time in a sequential, self-limiting, manner.; A thin film results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is their conformality and the tact that the amount of control provided by an ALD arrangement (where the reacting precursors are spatially separated) allows to obtain very thin deposited layers (as fine as 0.1 A per cycle).; Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films, but are stable enough to be handled and safely delivered to the reaction chamber.
- Standard Packaging
- 100 g
- 2 kg
- 15 kg
- 195 kg
- Applicable Processes
- Chemicals Production
- Polymer Manufacturing
- Chemical Inventories
- AICS (Australia)
- CICR (Turkey)
- DSL (Canada)
- EINECS (EU)
- ENCS (Japan)
- IECSC (China)
- INSQ (Mexico)
- KECI (Korea)
- Base Chemicals Functions
- Intermediate
Technical data
Table 1 of 4
5 rows| Characteristic | Value | Unit |
|---|---|---|
| Enthalpy of Fusion | 18.4 | kJ/mol |
| Enthalpy of Evaporation | 45.6 | kcal/mole |
| Delta H Vaporization | 10.9 | kcal/mole |
| Boiling Point | 175 - 176 | °C |
| Melting Point | 17.4 | °C |
Table 2 of 4
18 rows| Characteristic | Value | Unit |
|---|---|---|
| Dipole Moment | 1.09 | debye |
| Vapor Pressure (at 23°C) | 1.0 | mmHg |
| Ring Strain | 1.0 | kJ/mol |
| Surface Tension (at 20 °C) | 17.9 | mN/m |
| Critical Temperature | 314.0 | °C |
| Critical Pressure | 1.03 | mPa |
| Cryoscopic Constant | 11.2 | — |
| Ethylene Acrylate Copolymer (polymerization) | 79.0 | kJ/mol |
| Octanol/water Partition Coefficient (log Kow) | 5.1 | — |
| Hydrolytic Sensitivity | 1 (No significant reaction with aqueous systems) | — |
| Surface Tension | 17.9 | mN/m |
| Molecular Weight | 296.61 | g/mol |
Table 3 of 4
3 rows| Characteristic | Value | Unit |
|---|---|---|
| Specific Heat | 502.0 | J/gm/°C |
| Auto-ignition Temperature | 400.0 | °C |
| Coefficient of Thermal Expansion | 0.8 x 10⁻³ | K⁻¹ |
Table 4 of 4
1 row| Characteristic | Value | Unit |
|---|---|---|
| Water | 50.0 | g/l |
